Sukjong Bae serves as a Principal Engineer and Team Leader in the Next Generation Material R&D division at 삼성전자, where he plays a pivotal role in advancing cutting-edge technologies in photomask fabrication and lithography. With a focus on EUV (Extreme Ultraviolet) pellicle and blank mask...
Sukjong Bae serves as a Principal Engineer and Team Leader in the Next Generation Material R&D division at 삼성전자, where he plays a pivotal role in advancing cutting-edge technologies in photomask fabrication and lithography. With a focus on EUV (Extreme Ultraviolet) pellicle and blank mask material development, Sukjong is at the forefront of innovations that are crucial for the semiconductor industry. His expertise in photomask patterning technology, particularly in electron beam placement control on EUV masks, positions him as a key contributor to enhancing the precision and efficiency of semiconductor manufacturing processes.
Sukjong's work extends to the application of high-power laser systems for critical dimension (CD) and registration (Regi) control, where he develops methodologies that integrate e-beam lithography and advanced process control (APC) techniques. His involvement in FPD (Flat Panel Display) mask development, utilizing multi-beam laser writer systems and etch control systems, showcases his versatility and deep understanding of both semiconductor and display technologies.
Additionally, Sukjong is pioneering the use of super-resolution microscopy and AFM (Atomic Force Microscopy) lithography, which are essential for pushing the boundaries of resolution in lithography technology. His comprehensive skill set, which includes expertise in photomask technology, high-power laser applications, and advanced microscopy techniques, enables him to tackle complex challenges in mask fabrication process development. As the semiconductor industry continues to evolve, Sukjong Bae's contributions are instrumental in driving innovation and ensuring the precision required for next-generation devices.
